| 发明名称 |
METHOD FOR FORMING ORGANIC SEMICONDUCTOR FILM |
| 摘要 |
A method for forming an organic semiconductor film includes: forming a solution film by applying a solution containing an organic semiconductor material and a solvent to at least a part of a substrate; and drying the solution film by irradiating at least a part of the solution film with electromagnetic waves with a wavelength of at least 8 μm and an energy density of from 0.1 to 10 J/cm2 on the surface of the solution film before the solution film dries. An organic semiconductor film having good crystallinity can be formed by the method. |
| 申请公布号 |
US2015364686(A1) |
申请公布日期 |
2015.12.17 |
| 申请号 |
US201514835317 |
申请日期 |
2015.08.25 |
| 申请人 |
FUJIFILM CORPORATION |
发明人 |
MAEHARA Yoshiki;USAMI Yoshihisa |
| 分类号 |
H01L51/00 |
主分类号 |
H01L51/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for forming an organic semiconductor film, the method comprising:
when forming an organic semiconductor film made of an organic semiconductor material, forming a solution film by applying a solution containing at least an organic semiconductor material and a solvent to at least a part of a substrate; and drying the solution film by irradiating at least a part of the solution film with electromagnetic waves with a wavelength of at least 8 μm and an energy density of from 0.1 to 10 J/cm2 on the surface of the solution film before the solution film dries. |
| 地址 |
Tokyo JP |
