发明名称 SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
摘要 A semiconductor memory device includes bodies electrically floating; sources; drains; gate electrodes, each of which is adjacent to one side surface of the one of the bodies via a gate dielectric film; plates, each of which is adjacent to the other side surface of the one of the bodies via a plate dielectric film; first bit lines on the drains, the first bit lines including a semiconductor with a same conductivity type as that of the drains; and emitters on the semiconductor of the first bit lines, the emitters including a semiconductor with an opposite conductivity type to that of the semiconductor of the first bit lines, wherein the emitters are stacked above the bodies and the drains.
申请公布号 US2010019304(A1) 申请公布日期 2010.01.28
申请号 US20090497010 申请日期 2009.07.02
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MINAMI YOSHIHIRO;OHSAWA TAKASHI;SHINO TOMOAKI;HAMAMOTO TAKESHI;NITAYAMA AKIHIRO
分类号 H01L27/06;H01L21/8249 主分类号 H01L27/06
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