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发明名称
CHAMBER FOR A HIGH ENERGY EXCIMER LASER SOURCE
摘要
申请公布号
EP2036169(A2)
申请公布日期
2009.03.18
申请号
EP20070777259
申请日期
2007.05.22
申请人
CYMER, INC.
发明人
STEIGER, THOMAS, D.;PARTLO, WILLIAM, N.
分类号
H01S3/20;H01S3/03;H01S3/225
主分类号
H01S3/20
代理机构
代理人
主权项
地址
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