摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus capable of precisely monitoring the presence or absence of plasma discharge or discharge abnormality. <P>SOLUTION: A discharge detection sensor 23 comprising a dielectric member 21 and a probe electrode unit 22 is attached into an opening 2a disposed in a lid 2 composing a vacuum chamber to receive a potential change caused in a probe electrode 22b depending on the change of plasma discharge by means of a wave detector, and a detecting signal is output whenever a potential change meeting a predetermined condition occurs. A plurality of counters that count a detecting signal outputted from the waveform detector and hold a count rate are controlled by a counter controller 41 to perform counting only at a timing corresponding to a preset waveform monitoring time zone, and only the waveform appearing at a significant timing for determination is counted. <P>COPYRIGHT: (C)2009,JPO&INPIT |