METHODS AND APPARATUS FOR REDUCING THE CONSUMPTION OF REAGENTS IN ELECTRONIC DEVICE MANUFACTURING PROCESSES
摘要
<p>A substrate coating system is provided which includes a substrate coating chamber; a gas box connected to the coating chamber and adapted to provide reagent gases to the coating chamber; and a reagent reclaim system connected to the substrate coating chamber and the gas box, wherein the reagent reclaim system includes a wet scrubber connected to the coating chamber; a polisher connected to the wet scrubber; and a dryer connected to the polisher and the gas box.</p>
申请公布号
WO2008156744(A1)
申请公布日期
2008.12.24
申请号
WO2008US07514
申请日期
2008.06.16
申请人
APPLIED MATERIALS, INC.;CLARK, DANIEL, O.;BACHRACH, ROBERT, Z.;MOALEM, MEHRAN;JUNG, JAY, J.
发明人
CLARK, DANIEL, O.;BACHRACH, ROBERT, Z.;MOALEM, MEHRAN;JUNG, JAY, J.