发明名称 METHODS AND APPARATUS FOR REDUCING THE CONSUMPTION OF REAGENTS IN ELECTRONIC DEVICE MANUFACTURING PROCESSES
摘要 <p>A substrate coating system is provided which includes a substrate coating chamber; a gas box connected to the coating chamber and adapted to provide reagent gases to the coating chamber; and a reagent reclaim system connected to the substrate coating chamber and the gas box, wherein the reagent reclaim system includes a wet scrubber connected to the coating chamber; a polisher connected to the wet scrubber; and a dryer connected to the polisher and the gas box.</p>
申请公布号 WO2008156744(A1) 申请公布日期 2008.12.24
申请号 WO2008US07514 申请日期 2008.06.16
申请人 APPLIED MATERIALS, INC.;CLARK, DANIEL, O.;BACHRACH, ROBERT, Z.;MOALEM, MEHRAN;JUNG, JAY, J. 发明人 CLARK, DANIEL, O.;BACHRACH, ROBERT, Z.;MOALEM, MEHRAN;JUNG, JAY, J.
分类号 H01L21/306;C23C16/00 主分类号 H01L21/306
代理机构 代理人
主权项
地址