发明名称 DOWNFLOW GENERATING MECHANISM AND SUBSTRATE TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a downflow generating mechanism hardly generating vibration with low power consumption and also hardly generating pressure difference in a small environment. SOLUTION: This downflow generating mechanism comprises: a cleaning gas supplying mechanism 4 for supplying a cleaning gas; a cleaning gas storing space 5 to which the cleaning gas is supplied from the cleaning gas supplying mechanism 4, and of which an internal pressure is a positive pressure to a pressure inside of the small environment 3 in which a cleaning level is kept higher in comparison with a circumferential one; and a plurality of holes 8 communicating the cleaning gas storing space 5 and the inside of the small environment 3. The cleaning gas is jetted to the inside of the small environment 3 from the cleaning gas storing space 5 through the plurality of holes 8 to generate the downflow inside of the small environment 3. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009198015(A) 申请公布日期 2009.09.03
申请号 JP20080036888 申请日期 2008.02.19
申请人 TOKYO ELECTRON LTD 发明人 KIKUSHIMA HIROTO
分类号 F24F7/06;H01L21/02;H01L21/3065;H01L21/677 主分类号 F24F7/06
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