| 摘要 |
<p>PURPOSE: An applying device, developing device, applying method, developing method, and recording medium are provided to reduce a load of each main arm, thereby increasing a yield. CONSTITUTION: A processing block(S2) includes a resist film forming unit and a substrate inspecting unit(43). A carrier block(S1) includes a transfer device for a carrier block. The resist film forming unit and a substrate inspecting unit are overlapped in the processing block. The resist film forming unit includes a plurality of processing units and a transfer device for a forming unit. The substrate inspecting unit includes a substrate inspecting unit and a transfer device for inspecting a substrate.</p> |
