| 摘要 |
<p>PURPOSE: A magnetic tunnel junction device manufacturing method is provided to prevent the characteristic deterioration of a magnetic tunnel junction by preventing the generation of a conductive product from a metallic layer. CONSTITUTION: A magnetic tunnel junction layer(27A) is formed on a substrate. An electrode pattern is formed on the magnetic tunnel junction layer. A sacrificial pattern(29) covers the entire surface of the electrode pattern. The magnetic tunnel junction layer is etched by using the sacrificial pattern as an etching barrier wall. The sacrificial pattern is removed.</p> |
