发明名称 MIRROR AND EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a mirror having superior stability against heat and an EUV light generation device using the mirror. <P>SOLUTION: The mirror includes: a substrate 111; a heat diffusion layer 112 formed on the main surface of the substrate and having higher heat-conductivity than the substrate; and a high reflection film 113 formed on the heat diffusion layer and having lower heat-conductivity than the heat diffusion layer. By this arrangement, the heat generated in a laser beam irradiation portion is widely distributed by the heat diffusion layer 112, and as a result, the heat is efficiently discharged through the whole substrate 111. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011222958(A) 申请公布日期 2011.11.04
申请号 JP20100283717 申请日期 2010.12.20
申请人 KOMATSU LTD;GIGAPHOTON INC 发明人 KAMEDA HIDENOBU;WAKABAYASHI OSAMU;MORIYA MASATO
分类号 H01L21/027;G02B5/08 主分类号 H01L21/027
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