发明名称 APPARATUS AND METHOD FOR MEASURING X-RAY DIFFRACTION
摘要 <P>PROBLEM TO BE SOLVED: To highly accurately measure a residual stress of a measuring object despite mounting accuracy of an imaging plate. <P>SOLUTION: A controller CT irradiates a reference object BOB whose residual stress is 0 and a measuring object with X rays from an X-ray emitter 13 to capture diffraction rings of the reference object BOB and the measuring object OB on an imaging plate 28. The controller CT detects the shapes of both the captured diffraction rings respectively, calibrates the shape of the diffraction ring of the measuring object OB using the shape of the diffraction ring of the reference object BOB, and reduces the influence of a mounting error of the imaging plate 28 with respect to a table 27. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013104673(A) 申请公布日期 2013.05.30
申请号 JP20110246443 申请日期 2011.11.10
申请人 PULSTEC INDUSTRIAL CO LTD 发明人 MARUYAMA YOICHI
分类号 G01N23/20 主分类号 G01N23/20
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