| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a mask blank for mold production, a mask blank with resist for the mold production, and a method for producing a mold which drastically shorten a production period of the mold by forming a fine pattern in high pattern accuracy.SOLUTION: A mask blank is used in producing a sub-master mold by imprint-transferring a fine pattern provided on a surface of a master mold, and has a hard mask layer on a substrate, where the hard mask layer contains a chromium compound layer having a chemical formula CrONC(where x>0).</p> |
