发明名称 VAPOR-DEPOSITED FILM, METHOD FOR PRODUCING THE SAME, PACKAGING MATERIAL, AND VACUUM INSULATION BODY
摘要 <p>PROBLEM TO BE SOLVED: To provide a vapor-deposited film which has suppressed defects such as omitted vapor deposition in a vapor-deposited layer, cracks, and the like, is excellent in adhesion of the vapor-deposited film to a substrate film, and has suppressed deterioration of a gas barrier property, and to provide a method for producing the same, a packaging material, and a vacuum insulation body.SOLUTION: Provided is a vapor-deposited film comprising a substrate film and a vapor-deposited layer laminated at least on one surface of the substrate film. The substrate film contains a vinyl alcohol-based polymer (A) and a saturated ketone (B), where an amount of the saturated ketone (B) in the substrate film is 0.01 ppm or more and 100 ppm or less. The saturated ketone (B) preferably has 3 to 8 carbon atoms. As the saturated ketone (B), preferable is at least one selected from the group consisting of acetone, methyl ethyl ketone, and 2-hexanone. The vapor deposited layer is preferably laminated on both surfaces of the substrate film. An average thickness of the vapor-deposited layer preferably is 15 nm or more and 150 nm or less.</p>
申请公布号 JP2015071248(A) 申请公布日期 2015.04.16
申请号 JP20130207777 申请日期 2013.10.02
申请人 KURARAY CO LTD 发明人 KAWAI HIROSHI;NONAKA YASUHIRO
分类号 B32B27/30;B65D65/40;B65D81/24;C23C14/14;F16L59/06 主分类号 B32B27/30
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