| 摘要 |
The present invention relates to an interferometric reflectometry module comprising: a light source; a linear filter unit for filtering a wavelength of a certain area and a beam only in a spectrum range; a collimation lens, converting the filtered beam from the linear filter unit to a parallel beam; a beam splitter for transmitting the reflected beam from the wafer; a patterned multi-layered wafer, wherein the incident beam is reflected; an imaging optical system for detecting the reflected beam from the wafer; and a computer monitor for displaying the detected image. The linear filter unit is configured such that at least two linear variable filters precisely controls the position by a stepping motor. According to the present invention, through the interferometric reflectometry module, a signal of a clear sine wave in the reflected beam from multiple integrated wafer or multi-layered wafer can be detected, the thickness of the pattern on the wafer can be precisely monitored, and the endpoint can be detected. |
