| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition which can manufacture a resist pattern with reduced pattern collapse and defects.SOLUTION: A resist composition contains resin having a structural unit represented by a formula (I), resin that has a structural unit represented by a formula (II) and is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in the aqueous alkali solution by the action of acid, and an acid generator. In the formulas, Rrepresents a hydrocarbon group having a fluorine atom; and ring Trepresents a sultone ring that may contain a substitution group. |
