HOLDING MATERIAL FOR GAS-PROCESSING DEVICE, GAS-PROCESSING DEVICE, AND METHOD RELATING TO SAME

摘要

Provided are a holding material for a gas treatment device, a gas treatment device, and methods for those, which achieve proper control of a frictional resistance between the holding material and a casing. A method of treating a gas according to the present invention is a method of treating a gas with a gas treatment device including a treatment structure (20), a casing (30) made of a metal for housing the treatment structure and a holding material (10) made of inorganic fibers placed between the treatment structure and the casing, the method including: placing an organic polymer (40) between the holding material and the casing so that the organic polymer is brought into contact with an outer surface (11) of the holding material and an inner surface (31) of the casing during treatment of the gas; and treating the gas under a condition that a temperature of the casing is equal to or higher than a softening temperature of the organic polymer and lower than a decomposition temperature of the organic polymer.