发明名称 EXPOSURE METHOD AND EXPOSURE DEVICE, AND METHOD OF MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an exposure device which accurately drives a stage in a desired direction during exposure.SOLUTION: In an exposure device, when exposing, positional information on a stage WST is measured by a Y head 64 and an X-head 66 which are respectively opposing to Y scales 39Y, 39Y, and X scales 39X, 39X. Movement in an X direction (or Y direction) of the stage WST is controlled while compensating a measurement error of an encoder system generated due to a displacement of the stage WST in a direction different from the X direction (or Y direction) based on measurement information on the encoder system including heads 64, 66.
申请公布号 JP2015212834(A) 申请公布日期 2015.11.26
申请号 JP20150127320 申请日期 2015.06.25
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 G03F7/20;G01B11/00;G01D5/347;H01L21/68 主分类号 G03F7/20
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