THIN FILM DEPOSITION APPARATUS USING ELECTRIC FILED AND THIN FILM DEPSOTION METHOD

摘要

A thin film deposition apparatus and a thin film deposition method using an electric field are provided. The thin film deposition apparatus comprises: a first substrate; a plurality of electrodes in a 2D arrangement on the first substrate, whose voltage can be controlled; and a solution provided on the electrodes and in which charged nanoparticles are distributed, wherein the charged nanoparticles are selectively deposited on at least a part of the electrodes by independently applying a predetermined voltage to each of the electrodes.