Interference exposure device and method

摘要

An interference exposure device, including: a light source (100) for providing an exposure light beam; a light homogenizer-collimator (200) for homogenizing and collimating the exposure light beam; an interference unit (300) including at least two gratings (303) for converting the exposure light beam into at least two coherent light beams and making the coherent light beams converge on a substrate surface to form thereon an interference exposure pattern, the gratings (303) each having a period and being distributed in correspondence with a desired exposure pattern; a driving and supporting means (406) for supporting and carrying the substrate to move with at least three degrees of freedom; and a measuring element (500) for measuring an angle between coordinate systems of the interference unit (300) and the means (406) to adjust an exposure position of the means (406) based on a measurement result of the measuring element (500) before exposing the substrate.

主权项

1. An interference exposure apparatus, comprising:
a light source for providing an exposure light beam; a light homogenizer-collimator for homogenizing and collimating the exposure light beam emanating from the light source; an interference unit including at least two gratings for converting the exposure light beam into at least two coherent light beams, the interference unit being movable in a vertical direction to make the at least two coherent light beams converge on a surface of a substrate to form an interference exposure pattern, the at least two gratings each having a period in correspondence with a period of a desired exposure pattern and being distributed in correspondence with a distribution characteristic of the desired exposure pattern; driving and supporting means for supporting the substrate and carrying the substrate to move with at least three degrees of freedom; and measuring and alignment means for measuring an angle between a coordinate system of the interference unit and a coordinate system of the driving and supporting means so as to adjust an exposure position of the driving and supporting means based on a measurement result of the measuring and alignment means before exposing the substrate.