发明名称 Liquid processing apparatus, liquid processing method and storage medium
摘要 There is provided a liquid processing apparatus including a first and a second processing regions provided in a left-right direction, each for accommodating a substrate and performing a process on the substrate by a processing solution from a nozzle; a rotary body rotatable about a vertical axis; a plurality of nozzles provided at the rotary body while kept in a standby state at an outside of the processing regions, commonly used for the processing regions; a nozzle transfer device, having a nozzle holder moving back and forth, provided at the rotary body and configured to transfer a nozzle into a selected one of the processing regions while holding the selected nozzle by the nozzle holder; and a rotation driving unit configured to rotate the rotary body so as to allow a front of the nozzle holder in a forward/backward direction thereof to face the selected one of the processing regions.
申请公布号 US9195138(B2) 申请公布日期 2015.11.24
申请号 US201113222049 申请日期 2011.08.31
申请人 TOKYO ELECTRON LIMITED 发明人 Sasagawa Norihiko;Inada Hiroichi;Takiguchi Yasushi
分类号 G03F7/18;G03F7/16;H01L21/30;H01L21/67;G03F7/30 主分类号 G03F7/18
代理机构 Pearne & Gordon LLP 代理人 Pearne & Gordon LLP
主权项 1. A liquid processing apparatus comprising: a first processing region and a second processing region arranged in a left-right direction, each for accommodating therein a substrate horizontally and performing therein a process on the substrate by a processing solution from a nozzle; a rotary body positioned at a rear side of an arrangement of the first and the second processing regions, and configured to be rotatable about a vertical axis; a plurality of processing nozzles provided on the rotary body such that the plurality of processing nozzles rotate with the rotary body while kept in a standby state at an outside of the first processing region and the second processing region, commonly used for the first processing region and the second processing region, and configured to supply different kinds of processing solutions to the substrate, respectively; a nozzle transfer device, having a nozzle holder capable of being moved back and forth, provided on the rotary body such that the nozzle transfer device rotates with the rotary body and the plurality of processing nozzles and configured to transfer a processing nozzle selected from the plurality of processing nozzles into a selected one of the first and the second processing regions while holding the selected processing nozzle by the nozzle holder; and a rotation driving unit configured to rotate the rotary body so as to allow a front of the nozzle holder in a forward/backward direction thereof to face the selected one of the first and the second processing regions.
地址 Tokyo JP