Method of detecting a defect of a substrate and apparatus for performing the same

摘要

In a method of detecting a defect of a substrate, a first light having a first intensity may be irradiated to a first region of the substrate through a first aperture. A defect in the first region may be detected using a first reflected light from the first region. A second light having a second intensity may be irradiated to a second region of the substrate through a second aperture. A defect in the second region may be detected using a second reflected light from the second region. Thus, the defects by the regions of the substrate may be accurately detected.

主权项

1. A method of detecting a defect of a substrate, the method comprising:
irradiating a first light having a first intensity to a first region of the substrate through a first aperture to provide a first reflected light; detecting a defect in the first region based on the first reflected light from the first region; changing the first light into a second light having a second intensity at a time when an inspection region is changed from the first region to a second region of the substrate, wherein the second region is different than the first region; changing the first aperture into a second aperture at the time when the inspection region is changed from the first region to the second region, wherein changing the first aperture into the second aperture comprises controlling a spatial light modulator, and wherein the first and second apertures are defined in the spatial light modulator; irradiating the second light to the second region of the substrate through the second aperture to provide a second reflected light; and detecting a defect in the second region based on the second reflected light from the second region.