Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device

摘要

A copolymer includes repeat units derived from a lactone-substituted monomer, a base-soluble monomer having a pKa less than or equal to 12, a photoacid-generating monomer, and an acid-labile monomer having the formula;
wherein R1, R2, R3, and Ar are defined herein. The copolymer can be used as a component of a photoresist composition, and the photoresist composition can be coated on a substrate having one or more layers to be patterned, or used in a method of forming an electronic device.

主权项

1. A copolymer comprising repeat units derived from an acid-labile monomer having formula (I)wherein
R1 is an unsubstituted or substituted C1-18 alkyl; R2 is an unsubstituted or substituted C1-18 alkyl, an unsubstituted or substituted C7-18 arylalkyl, or an unsubstituted or substituted C6-18 aryl; R3 is —H, —F, —CH3, or —CF3; and Ar is an unsubstituted or substituted C6-18 aryl; provided that R2 and Ar collectively include at least nine carbon atoms; a lactone-substituted monomer; a base-soluble monomer having a pKa less than or equal to 12; and a photoacid-generating monomer comprising