| 摘要 |
The present invention generally relates to systems and methods for visual process analysis. The disclosed techniques can include: obtaining a theoretical and an empirical process model, generating a theoretical process layout corresponding to the theoretical process model, where the theoretical process layout is generated using a layout algorithm, generating an empirical process layout corresponding to the empirical process model, where the empirical process layout is generated using the layout algorithm, superposing the empirical process layout onto the theoretical process layout, such that a superposition layout is generated, annotating the superposition layout based on ugliness indicators, such that an annotated superposition layout is generated, and causing the annotated superposition layout to be displayed. |
| 主权项 |
1. A computer-implemented method for detecting at least one difference between a theoretical process and an empirical process, the method comprising:
obtaining a theoretical process model; obtaining, using an electronic processor, an empirical process model corresponding to the theoretical process model; generating, using an electronic processor, a theoretical process layout corresponding to the theoretical process model, wherein the theoretical process layout is generated using a layout algorithm; generating, using an electronic processor, an empirical process layout corresponding to the empirical process model, wherein the empirical process layout is generated using the layout algorithm; superposing, using an electronic processor, the empirical process layout onto the theoretical process layout, whereby a superposition layout is generated; annotating, using an electronic processor, the superposition layout based on ugliness indicators, whereby an annotated superposition layout is generated; and causing, using an electronic processor, the annotated superposition layout to be displayed. |
