| 发明名称 |
Edge Coupling Device Fabrication |
| 摘要 |
A method of fabricating an edge coupling device and an edge coupling device are provided. The method includes removing a portion of cladding material to form a trench over an inversely tapered silicon waveguide, depositing a material having a refractive index greater than silicon dioxide over remaining portions of the cladding material and in the trench, and removing a portion of the material within the trench to form a ridge waveguide. |
| 申请公布号 |
US2015293303(A1) |
申请公布日期 |
2015.10.15 |
| 申请号 |
US201514680917 |
申请日期 |
2015.04.07 |
| 申请人 |
Futurewei Technologies, Inc. |
发明人 |
Pan Huapu;Liu Zongrong;Wei Hongzhen;Chen Hongmin |
| 分类号 |
G02B6/136;G02B6/122;G02B6/132;G02B6/12 |
主分类号 |
G02B6/136 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of fabricating an edge coupling device, comprising:
removing a portion of cladding material to form a trench over an inversely tapered silicon waveguide; depositing a material having a refractive index greater than silicon dioxide over remaining portions of the cladding material and in the trench; and removing a portion of the material within the trench to form a ridge waveguide. |
| 地址 |
Plano TX US |
