发明名称 Fixed contact structure
摘要 There is provided a fixed contact structure, including: a substrate; at least one fixed contact which is disposed on the substrate; a movable contact which slides on the corresponding fixed contact in a sliding direction; a resist layer which is consecutively disposed on the substrate outside both ends of the fixed contact with respect to the sliding direction; and gaps which are formed outside both ends of the fixed contact with respect to a direction orthogonal to the sliding direction.
申请公布号 US9159510(B2) 申请公布日期 2015.10.13
申请号 US201113580852 申请日期 2011.06.01
申请人 Yazaki Corporation 发明人 Urakami Shuhei
分类号 H01R13/02;H01H15/00;H01H1/40;H01H19/58 主分类号 H01R13/02
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A fixed contact structure, comprising: a substrate; fixed contacts, each of which is monolithic and located on the substrate; movable contacts, each of which is configured to slide on a corresponding one of the fixed contacts in a sliding direction, each of the moveable contacts and each corresponding one of the fixed contacts being arranged in a one-to-one relationship, wherein a conductive contact is formed between each moveable contact and the corresponding one of the fixed contacts when placed in contact; and a resist layer on the substrate at opposing ends of the fixed contacts with respect to the sliding direction, wherein the resist layer is immediately adjacent to the opposing ends of the fixed contacts, and gaps are provided at opposing lateral sides of each of the fixed contacts in a direction orthogonal to the sliding direction, and wherein a height of a surface of the fixed contact is substantially equal to a height of a surface of the resist layer as measured from a common place of reference.
地址 Tokyo JP
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