发明名称 SEMICONDUCTOR MATERIAL
摘要 A semiconductor wafer comprising a substrate; a first AlGaN layer on the substrate; a second AlGaN layer on the first AlGaN layer; a GaN layer on the second AlGaN layer; and a plurality of crystalline GaN islands between the first and second AlGaN layers.
申请公布号 US2015280058(A1) 申请公布日期 2015.10.01
申请号 US201314432529 申请日期 2013.10.02
申请人 CAMBRIDGE ENTERPRISE LIMITED ;Intellec Limited 发明人 Kappers Menno;Zhu Dandan
分类号 H01L33/06;H01L31/0352;H01L31/18;H01L31/0304;H01L33/00;H01L33/32 主分类号 H01L33/06
代理机构 代理人
主权项 1. A semiconductor wafer comprising: a substrate; a first AlGaN layer on the substrate; a second AlGaN layer on the first AlGaN layer; a GaN layer on the second AlGaN layer; and a plurality of crystalline GaN islands between the first and second AlGaN layers.
地址 Cambridgeshire GB