发明名称 SUBSTRATE LIQUID PROCESSING APPARATUS AND METHOD, AND COMPUTER-READABLE RECORDING MEDIUM WITH SUBSTRATE LIQUID PROCESSING PROGRAM RECORDED THEREIN
摘要 Disclosed are a substrate liquid processing apparatus and method for performing a liquid processing on a substrate using a processing liquid, and a computer-readable recording medium with a substrate liquid processing program recorded therein. In the method, a first chemical liquid supply step is performed to supply a first chemical liquid from a first chemical liquid supply unit to a processing liquid storage unit, a first chemical liquid purifying step is performed to purify the first chemical liquid in a chemical liquid purifying unit, a second chemical liquid supply step is performed to supply a second chemical liquid from a second chemical liquid supply unit to the processing liquid storage unit, and a processing liquid supply step is performed to supply the processing liquid obtained by mixing the first and second chemical liquids from the processing liquid supply unit to substrate liquid processing units.
申请公布号 US2015273538(A1) 申请公布日期 2015.10.01
申请号 US201514666896 申请日期 2015.03.24
申请人 Tokyo Electron Limited 发明人 Saiki Daisuke;Mizota Shogo;Yabuta Takashi;Nonaka Jun;Nagamatsu Tatsuya;Tanaka Koji;Maezono Tomiyasu
分类号 B08B3/14 主分类号 B08B3/14
代理机构 代理人
主权项 1. A substrate liquid processing apparatus comprising: a substrate liquid processing unit configured to process a substrate using a processing liquid; a processing liquid storage unit configured to store the processing liquid; a processing liquid supply unit configured to supply the processing liquid from the processing liquid storage unit to the substrate liquid processing unit; a first chemical liquid supply unit configured to supply a first chemical liquid to the processing liquid storage unit; a second chemical liquid supply unit configured to supply a second chemical liquid to the processing liquid storage unit; a chemical liquid purifying unit configured to circulate and purify the first chemical liquid or the second chemical liquid stored in the processing liquid storage unit; and a control unit configured to control the processing liquid supply unit, the first chemical liquid supply unit, the second chemical liquid supply unit, and the chemical liquid purifying unit, wherein the control unit executes: a first chemical liquid supply step of supplying the first chemical liquid from the first chemical liquid supply unit to the processing liquid storage unit; a first chemical liquid purifying step of purifying the first chemical liquid in the chemical liquid purifying unit; a second chemical liquid supply step of supplying the second chemical liquid from the second chemical liquid supply unit to the processing liquid storage unit; and a processing liquid supply step of supplying the processing liquid from the processing liquid supply unit to the substrate liquid processing unit, the processing liquid being produced by mixing the first chemical liquid with the second chemical liquid.
地址 Tokyo JP