ALKALI ETCHING MASK AGENT COMPOSITION, AND ETCHING METHOD

摘要

PROBLEM TO BE SOLVED: To provide: an alkali etching mask agent composition which enables the formation of an alkali etching mask superior in alkali resistance; and an alkali etching method arranged by use of such an alkali etching mask agent composition.SOLUTION: An alkali etching mask agent composition according to the present invention comprises polysiloxane having a structural unit expressed by the general formula (a1) below. The content of the structural unit expressed by the general formula (a1) is 15-100 mol% to all of structural units in the polysiloxane. In the formula, Rrepresents a single bond or an alkylene group with 1-5 carbon atoms; and Rrepresents an aryl group with 6-20 carbon atoms, which may have, as a substituent group, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, an aryl group, a cyano group, or an amino group.