发明名称 ABERRATION CORRECTION OPTICAL DEVICE FOR CHARGED PARTICLE BEAM OPTICAL SYSTEM, AND OPTICAL SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an aberration correction optical device having a plurality of multipole type Wien filters, and capable of correcting aberration of a charged particle beam optical system. SOLUTION: This aberration correction optical device 1a for a charged particle beam optical system is provided with: two multipole type Wien filters 2 and 2' having the same size, and arranged so that the centers thereof coincide with a 1/4 plane position and a 3/4 plane position between an object plane and an image plane of the aberration correction optical device, respectively; and optical elements 3a arranged at an object plane position, an intermediate focusing plane position, and an image plane position of the aberration correction optical device and each having a two-directional focusing property. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007242490(A) 申请公布日期 2007.09.20
申请号 JP20060065143 申请日期 2006.03.10
申请人 EBARA CORP 发明人 MURAKAMI TAKESHI;SOFUGAWA TAKUJI;MORI SATOSHI;KARIMATA TSUTOMU
分类号 H01J37/153;H01J37/05 主分类号 H01J37/153
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