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发明名称
Method for controlling ion density in a sputtering system
摘要
申请公布号
EP1734149(A3)
申请公布日期
2007.09.19
申请号
EP20060011555
申请日期
2006.06.03
申请人
APPLIED FILMS CORPORATION
发明人
STOWELL, MICHAEL W.
分类号
C23C14/34;C23C14/54
主分类号
C23C14/34
代理机构
代理人
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