| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a microwave introduction tool in which effect of plasma density is suppressed and in which a microwave absorption rate (power absorption rate) does not decrease even if the length of the introduction tool is shortened, provide a plasma generating device equipped with this, and a plasma treatment device equipped with this. <P>SOLUTION: This is the microwave introduction tool mounted on a chamber 300 having a space to form the plasma, and provided with a wave guide body 100 protruding from a wall face of the chamber 300 toward the space to form the plasma, and the wave guide body 100 has an inner conductor 100b which is composed of a conductor and extending in one direction, and an outer conductor 100a which is composed of dielectric and covers the inner conductor 100b, and a recess and convex part 120 to influence an effective dielectric constant of the outer conductor 100a is formed on a surface of the outer conductor 100a. <P>COPYRIGHT: (C)2007,JPO&INPIT |
