| 摘要 |
Provided is a color resist remover composition for removing color resist and over coat of inferior substrates produced in the preparation process of a color filter of TFT-LCD, whereby the substrates can be used as a black mask or a glass substrate. The remover composition includes (a) 1 to 50 wt% of a hydroxide compound selected from the group consisting of an inorganic alkali hydroxide, alkyl ammonium hydroxide and phenyl alkyl ammonium hydroxide, in which the alkyl group has 1-4 carbon atoms, (b) 5 to 30 wt% of a sulfuric compound having a polarity, (c) 5 to 35 wt% of alkylene glycol ether, in which the alkyl group has 1 to 4 carbon atoms, (d) 2 to 30 wt% of alkylene glycol dialkyl ether, in which the alkyl group has 1 to 4 carbon atoms, (e) 2 to 30 wt% of water-soluble amine compound, and (f) the balance of water. The stripper composition can readily remove color resist in a short period of time and be rinsed away by water without using an organic solvent. |
