发明名称 3-D TRANSFORMER FOR HIGH FREQUENCY APPLICATIONS
摘要 A stressed metal technology may fabricate high-Q, three-dimensional microelectronic inductors and transformers. The fabrication method may allow the production of inductors and transformers on high-resistivity silicon substrate and with metal deposition of Au and Cr that is fully compatible with semiconductor fabrication technologies. The produced inductors and transformers exhibit Q factors > 60 at frequencies of 3 to 7 GHz. High efficiency, high-Q transformers with coupling factors 0.6<k<0.9 may be created with very high self-resonance frequencies.
申请公布号 WO2006063193(A2) 申请公布日期 2006.06.15
申请号 WO2005US44536 申请日期 2005.12.07
申请人 PURDUE RESEARCH FOUNDATION;WEON, DAEHEE;MOHAMMADI, SAEED;JEON, JONG-HYEOK;KATEHI, LINDA 发明人 WEON, DAEHEE;MOHAMMADI, SAEED;JEON, JONG-HYEOK;KATEHI, LINDA
分类号 H01F5/00 主分类号 H01F5/00
代理机构 代理人
主权项
地址