发明名称 Coating/developing apparatus and operation method thereof
摘要 A coating/developing apparatus has a carrier block including a first transfer device, a process block including processing modules, an examination block including examination modules and a second transfer device, and first to forth stages. A controller executes a first operation mode preset to transfer substrates from the process block and carrier block into the examination block in parallel. The first operation mode includes transferring substrates processed by the process block to the third or fourth stage through or not through an examination module by the second transfer device, transferring substrates to be only examined from a carrier in the carrier block to the second stage by the first transfer device, and transferring these substrates from the second stage to an examination modules by the second transfer device, and transferring substrates thus examined from the examination block to the third or fourth stage by the second transfer device.
申请公布号 US7575382(B2) 申请公布日期 2009.08.18
申请号 US20080166470 申请日期 2008.07.02
申请人 TOKYO ELECTRON LIMITED 发明人 KANEKO TOMOHIRO;MIYATA AKIRA
分类号 G03D5/00;G03B27/32;G06F19/00;H01L21/027;H01L21/677 主分类号 G03D5/00
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