发明名称 LOW MICROPIPE 100 MM SILICON CARBIDE WAFER
摘要 PROBLEM TO BE SOLVED: To provide a method of producing a high quality single crystal wafer of SiC in a larger size and a lower defect level in the crystal formed in a sublimation system using a seed crystal. SOLUTION: The single crystal wafer of SiC has a diameter of at least about 100 mm, a micropipe density of less than about 25 cm<SP>-2</SP>, and a polytype selected from a group consisting of 3C, 4H, 6H, 2H and 15R polytypes. The micropipe density represents a count of the total micropipes on the surface divided by the surface area of the wafer. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009078966(A) 申请公布日期 2009.04.16
申请号 JP20080244459 申请日期 2008.09.24
申请人 CREE INC 发明人 POWELL ADRIAN;BRADY MARK;LEONARD ROBERT TYLER
分类号 C30B29/36;C30B23/06;H01L21/338;H01L29/161;H01L29/78;H01L29/812 主分类号 C30B29/36
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