发明名称 THREE-DIMENSIONAL DIRECT-WRITE LITHOGRAPHY
摘要 <p>A method of creating a region of index change in a photopolymer includes providing a photopolymer having a photosensitivity to light of a particular wavelength and creating a region of index change in the photopolymer by applying direct write lithography to expose the photopolymer of the region to light that includes the particular wavelength.</p>
申请公布号 WO2006138587(A3) 申请公布日期 2009.04.16
申请号 WO2006US23520 申请日期 2006.06.16
申请人 THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODYCORPORATE;MCLEOD, ROBERT, R. 发明人 MCLEOD, ROBERT, R.
分类号 G02B6/12;G02B6/13;G02B21/18;G03F7/20 主分类号 G02B6/12
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