WORKPIECE PROCESSING SYSTEM, WORKPIECE PROCESSING METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, COATER/DEVELOPER, COATING/DEVELOPING METHOD AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a workpiece processing system capable of forming a uniform pattern, and to provide a workpiece processing method, exposure apparatus, exposure method, coater/developer, coating/developing method and device manufacturing method. SOLUTION: The workpiece processing system includes: a first processing device for performing first processing for a workpiece; and a second processing device for executing second processing to the workpiece and supplying the workpiece after second processing to the first processing device. The system further includes a controller for putting the workpiece before the second processing in a standby state on the basis of the difference in processing time caused by the difference in capability between the first processing device and the second processing device. COPYRIGHT: (C)2009,JPO&INPIT