| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having good sensitivity and pattern formation in normal exposure, liquid immersion exposure and double exposure, and to provide a pattern forming method using the positive resist composition. <P>SOLUTION: The positive resist composition contains (A) a compound generating acid by irradiation with active light or radiation, (B) a resin having a repeating unit having a non-acid leaving hydrocarbon group of a specific structure and increasing solubility to alkali developing solution by action of acid, and (C) a compound decomposed by action of acid and generating acid. The pattern forming method using the positive resist composition is provided. <P>COPYRIGHT: (C)2009,JPO&INPIT |
