发明名称 High purity silicon carbide structures
摘要 Processes for the purification of silicon carbide structures, including silicon carbide coated silicon carbide structures, are disclosed. The processes described can reduce the amount of iron contamination in a silicon carbide structure by 100 to 1000 times. After purification, the silicon carbide structures are suitable for use in high temperature silicon wafer processing.
申请公布号 US7888685(B2) 申请公布日期 2011.02.15
申请号 US20040900938 申请日期 2004.07.27
申请人 MEMC ELECTRONIC MATERIALS, INC. 发明人 SHIVE LARRY WAYNE;GILMORE BRIAN LAWRENCE
分类号 H01L29/15;C04B41/53;C04B41/91 主分类号 H01L29/15
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