发明名称 |
Lithography system, sensor, converter element and method of manufacture |
摘要 |
Charged particle beamlet lithography system for transferring a pattern to a surface of a target comprising a sensor for determining one or more characteristics of one or more charged particle beamlets. The sensor comprises a converter element for receiving charged particles and generating photons in response. The converter element comprises a surface for receiving one or more charged particle beamlets, the surface being provided with one or more cells for evaluating one or more individual beamlets. Each cell comprises a predetermined blocking pattern of one or more charged particle blocking structures forming multiple knife edges at transitions between blocking and non-blocking regions along a predetermined beamlet scan trajectory over the converter element surface. The converter element surface is covered with a coating layer substantially permeable for said charged particles and substantially impermeable for ambient light. An electrically conductive layer is located between the coating layer and the blocking structures.
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申请公布号 |
US8357906(B2) |
申请公布日期 |
2013.01.22 |
申请号 |
US201113053488 |
申请日期 |
2011.03.22 |
申请人 |
MAPPER LITHOPRAPHY IP B.V.;HANFOUG RABAH |
发明人 |
HANFOUG RABAH |
分类号 |
G21K5/10 |
主分类号 |
G21K5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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