发明名称 Polyaniline/gallium doped ZnO heterostructure device via plasma enhanced polymerization technique: Preparation, characterization and electrical properties
摘要 PURPOSE: A PANI(P-Polyaniline)/Ga(Gallium)-ZnO(Zinc Oxide) hetero junction structure device with improved electrical properties by gallium and ion doping is provided to provided a high barrier height, a low ideality factor, and an improved saturation current by doping gallium ion on the PANI/ZnO hetero junction structure device. CONSTITUTION: Gallium ion is doped on a PANI/n-ZnO hetero junction structure device. The PANI /n-ZnO hetero junction structure device is manufactured with plasma. The gallium ion doping uses gallium-zinc oxide nano particles. A saturation current of the PANI/n-ZnO hetero junction structure device increases about 12.8 times that before the gallium ion doping.
申请公布号 KR101244227(B1) 申请公布日期 2013.03.18
申请号 KR20110030485 申请日期 2011.04.04
申请人 发明人
分类号 H01L51/40 主分类号 H01L51/40
代理机构 代理人
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