发明名称 |
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE |
摘要 |
There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit (A) represented by the specific formula (I) capable of generating an acid on the side chain of the resin upon irradiation with an actinic ray or radiation, and a resist film formed with the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising: exposing the resist film, and developing the exposed resist film, and a method for manufacturing a semiconductor device, containing the pattern forming method, and a semiconductor device manufactured by the manufacturing method of the semiconductor device. |
申请公布号 |
KR20150006035(A) |
申请公布日期 |
2015.01.15 |
申请号 |
KR20147033629 |
申请日期 |
2013.05.31 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KAWABATA TAKESHI;TSUBAKI HIDEAKI;TAKIZAWA HIROO;YOKOKAWA NATSUMI |
分类号 |
G03F7/039;C08F212/02;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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