发明名称 193nm laser inspection system
摘要 A laser for generating an output wavelength of approximately 193.4 nm includes a fundamental laser, an optical parametric generator, a fourth harmonic generator, and a frequency mixing module. The optical parametric generator, which is coupled to the fundamental laser, can generate a down-converted signal. The fourth harmonic generator, which may be coupled to the optical parametric generator or the fundamental laser, can generate a fourth harmonic. The frequency mixing module, which is coupled to the optical parametric generator and the fourth harmonic generator, can generate a laser output at a frequency equal to a sum of the fourth harmonic and twice a frequency of the down-converted signal.
申请公布号 IL240009(D0) 申请公布日期 2015.09.24
申请号 IL20150240009 申请日期 2015.07.19
申请人 KLA-TENCOR CORPORATION 发明人
分类号 H01S 主分类号 H01S
代理机构 代理人
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