FILM FORMING METHOD AND FILM FORMING APPARATUS

摘要

A film forming method of forming a film by accelerating powder of a material with gas and spraying and depositing the powder onto a surface of a substrate with the powder being kept in a solid state includes: a substrate film forming step of forming a film. The film forming step includes jetting out the powder and inert gas from a nozzle towards the substrate, causing inside of the chamber to be under positive pressure by the inert gas, and depositing the powder on the surface of the substrate.

主权项

1. A film forming method of forming a film by accelerating powder of a material with gas and spraying and depositing the powder onto a surface of a substrate with the powder being kept in a solid state, the film forming method comprising:
a substrate arrangement step of arranging the substrate in a chamber; and a film forming step of forming a film, including:
jetting out the powder and inert gas from a nozzle towards the substrate;causing inside of the chamber to be under positive pressure by the inert gas; anddepositing the powder on the surface of the substrate.