发明名称 |
Semiconductor device and method of manufacturing the same |
摘要 |
A semiconductor device having a main electrode connected to a first semiconductor region and a second semiconductor layer on a semiconductor substrate so that a pn-junction diode is formed with the first semiconductor region being interposed and a Schottky barrier diode is formed with the second semiconductor layer being interposed on a surface of the semiconductor substrate, the semiconductor device includes a first electrode configured to ohmic-contact the first semiconductor region; a second electrode configured to Schottky-contact the second semiconductor layer and not having a portion directly contacting the first electrode; and a conductive reaction suppression layer to suppress a reaction between a material configuring the first electrode and a material configuring the second electrode are provided on the surface of the semiconductor substrate, and the main electrode is electrically connected to the first electrode and the second electrode. |
申请公布号 |
US9130063(B2) |
申请公布日期 |
2015.09.08 |
申请号 |
US201414496617 |
申请日期 |
2014.09.25 |
申请人 |
Sanken Electric Co., LTD. |
发明人 |
Kawaguchi Hiroko;Kumakura Hiromichi;Washiya Satoru;Yoshie Toru |
分类号 |
H01L27/095;H01L29/47;H01L29/812;H01L31/07;H01L31/108;H01L29/872;H01L29/45;H01L21/283;H01L29/16 |
主分类号 |
H01L27/095 |
代理机构 |
Banner & Witcoff, Ltd. |
代理人 |
Banner & Witcoff, Ltd. |
主权项 |
1. A semiconductor device comprising:
a semiconductor substrate, on which a semiconductor region having a first conductivity type is locally formed on a surface of a semiconductor layer having a second conductivity type opposite to the first conductivity type; a main electrode, which is provided on a surface of the semiconductor substrate and which is connected to the semiconductor region and the semiconductor layer such that a pn-junction diode is formed with the semiconductor region and a Schottky barrier diode is formed with the semiconductor layer; a first electrode configured to ohmic-contact the semiconductor region; a second electrode configured to Schottky-contact the semiconductor layer and not having a portion directly contacting the first electrode; and a conductive reaction suppression layer configured to contact the first electrode and the second electrode and to suppress a reaction between a material configuring the first electrode and a material configuring the second electrode are provided on the surface of the semiconductor substrate, wherein the main electrode is electrically connected to the first electrode and the second electrode. |
地址 |
Niiza-shi, Saitama JP |