发明名称 METHOD OF OXIDIZING TREATMENT OF TRANSITION METAL FILM AND OXIDIZING TREATMENT DEVICE
摘要 In this method of oxidizing treatment of a transition metal film for oxidizing a film containing a transition metal on the surface of an object to be treated, plasma of gas containing at least oxygen is generated, electrons are donated to neutralize the active species of oxygen in the plasma, neutral particles of the oxygen atoms are generated, and the neutral particles are irradiated onto the film containing the transition metal.
申请公布号 WO2015129413(A1) 申请公布日期 2015.09.03
申请号 WO2015JP53077 申请日期 2015.02.04
申请人 TOKYO ELECTRON LIMITED;TOHOKU TECHNO ARCH CO., LTD. 发明人 GU, XUN;SAMUKAWA, SEIJI
分类号 C23C16/56;C23C16/507;C23C16/511;H01L21/316;H01L27/105;H01L45/00;H01L49/00 主分类号 C23C16/56
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