APPARATUS FOR MONITORING GAS AND PLASMA PROCESS EQUIPMENT INCLUDING THE SAME

摘要

Disclosed are an apparatus for monitoring a gas, and plasma process equipment including the same. The apparatus includes: a housing having a gas inlet, a gas outlet, and windows; a light source which is closed to one of the windows and is arranged on the outside of the housing, and supplies a source light to a gas provided between the gas inlet and the gas outlet; a sensor which is closed to the other one of the windows and is arranged in the housing, and detects fluorescence emitted from the gas due to the source light; a coil which is arranged inside the housing between the gas inlet and the gas outlet, heats the gas between the light source and the sensor, and increases the fluorescence from the gas.