发明名称 EVAPORATIVE SYSTEMS AND METHODS FOR DAMPENING FLUID CONTROL IN A DIGITAL LITHOGRAPHIC SYSTEM
摘要 <p>A system and corresponding methods are disclosed for controlling the thickness of a layer of dampening fluid applied to a reimageable surface of an imaging member in a variable data lithography system. Following deposition of the dampening fluid layer, a gas is passed over a region of the fluid layer prior to pattern forming. The gas causes a controlled amount of the dampening fluid layer to evaporate such that the remaining layer is of a desired and controlled thickness. Among other advantages, improved print quality is obtained.</p>
申请公布号 IN1172CH2013(A) 申请公布日期 2015.08.21
申请号 IN2013CH01172 申请日期 2013.03.19
申请人 XEROX CORPORATION 发明人 LIU, CHU-HENG;KNAUSDORF, PETER
分类号 B41F7/00 主分类号 B41F7/00
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