发明名称 |
EVAPORATIVE SYSTEMS AND METHODS FOR DAMPENING FLUID CONTROL IN A DIGITAL LITHOGRAPHIC SYSTEM |
摘要 |
<p>A system and corresponding methods are disclosed for controlling the thickness of a layer of dampening fluid applied to a reimageable surface of an imaging member in a variable data lithography system. Following deposition of the dampening fluid layer, a gas is passed over a region of the fluid layer prior to pattern forming. The gas causes a controlled amount of the dampening fluid layer to evaporate such that the remaining layer is of a desired and controlled thickness. Among other advantages, improved print quality is obtained.</p> |
申请公布号 |
IN1172CH2013(A) |
申请公布日期 |
2015.08.21 |
申请号 |
IN2013CH01172 |
申请日期 |
2013.03.19 |
申请人 |
XEROX CORPORATION |
发明人 |
LIU, CHU-HENG;KNAUSDORF, PETER |
分类号 |
B41F7/00 |
主分类号 |
B41F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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