| 摘要 |
<p>PROBLEM TO BE SOLVED: To reduce misinformation in an inspection and to accurately detect a defect.SOLUTION: In a line width measuring part 411, a line width of a plurality of positions of each linear pattern element in one substrate is measured based on a photographed image acquired for the substrate. In a standard line width correction part 412, a standard line width of a linear pattern element shown by standard line width information 48 generated from design data is corrected based on a representative value of the line width of the plurality of positions so as to generate corrected standard line width information. Subsequently, the line width of the plurality of positions of each linear pattern element in the substrate is measured based on the photographed image acquired for the other one substrate. In a defect detection part 413, a defect in the actual pattern of the substrate is detected by comparing each of the line width of the plurality of positions with the standard line width of the linear pattern element shown by the corrected standard line width information. As a result, misinformation in the inspection can be reduced and the defect in the actual pattern can be accurately detected.</p> |
