| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection device for microlithography for photographing the visual field of an object.SOLUTION: A projection device includes an objective lens 110, at least one or more manipulators 121, 122, and 123 that manipulate one or more optical elements of the objective lens, a control unit 130 that adjusts or controls the one or more manipulators, a determination device 150 that determines at least one or more image aberrations of the objective lens, and a memory 140 that stores one or more upper bounds related to the specification of the objective lens including an upper bound of the image aberrations and/or the amount of travel of the manipulators. |
