| 发明名称 | Method for machining seed rods for use in a chemical vapor deposition polysilicon reactor | ||
| 摘要 | A method for machining a profile into a silicon seed rod using a machine. The silicon seed rod is capable of being used in a chemical vapor deposition polysilicon reactor. The machine includes a plurality of grinding wheels. The method includes grinding a v-shaped profile into a first end of the silicon seed rod with one of the plurality of grinding wheels and grinding a conical profile in a second end of the silicon seed rod with another of the plurality of grinding wheels. | ||
| 申请公布号 | US9102035(B2) | 申请公布日期 | 2015.08.11 |
| 申请号 | US201213417792 | 申请日期 | 2012.03.12 |
| 申请人 | MEMC Electronics Materials S.p.A. | 发明人 | Bovo Rodolfo;Molino Paolo |
| 分类号 | B24B49/12;B24B41/06;B24B1/00;B24B19/00;B24B7/16 | 主分类号 | B24B49/12 |
| 代理机构 | Armstrong Teasdale LLP | 代理人 | Armstrong Teasdale LLP |
| 主权项 | 1. A method for machining a profile into a silicon seed rod using a machine, the silicon seed rod used in a chemical vapor deposition polysilicon reactor, the machine comprising a plurality of grinding wheels, the method comprising: providing a silicon seed rod having a first end and an opposing second end; grinding a v-shaped profile into an end face of the first end of the silicon seed rod with one of the plurality of grinding wheels; and grinding a conical profile in the second end of the silicon seed rod with another of the plurality of grinding wheels. | ||
| 地址 | Novara IT | ||